- A method for fabricating lateral-tapered waveguide using strain relaxation pad method for fabricating spot size-converter using thereof and optic device using thereof

摘要

Using the contact exposure equipment, form a tip of about 0.6um by performing a lithography process using a mask that connects the pad to the tapered end to absorb the strain caused when forming the side-taper pattern, and then wet etching. A method for producing a mode converter with a highly uniform side-taper waveguide (or active layer) of 0.1 μm is disclosed. This eliminates the need for high resolution electron beam lithography and steppers, and reduces manufacturing costs. Even when contact exposure equipment is used, excessive deep wet etching is not required. It can increase. In addition, by integrating the side-taper composition of the mode converter produced by this method together with the optical device, it is possible to increase the position control and reproducibility of the mode converter to increase the yield.