首页> 外国专利> Material for ball-grid arrays comprises a plating layer formed from two metals which are mixed together on a metal material as the base material and a covering layer formed from the metal on the plating layer

Material for ball-grid arrays comprises a plating layer formed from two metals which are mixed together on a metal material as the base material and a covering layer formed from the metal on the plating layer

机译:用于球栅阵列的材料包括:由两种金属形成的镀层,该两种金属在作为基材的金属材料上混合在一起;以及覆盖层,由该金属在镀层上形成

摘要

Material comprises a plating layer (A) formed from a metal (X) and metal (Y) which are mixed together on a metal material as the base material and a covering layer (B) formed from the metal (X) on the plating layer. An Independent claim is also included for a process for electrically connecting a material of an electronic component. Preferred Features: The metal (X) is tin and the metal (Y) is silver, copper, zinc, bismuth or indium. The covering layer (B) is formed from tin on the plating layer.
机译:该材料包括:由金属(X)和金属(Y)形成的镀层(A),在金属材料上混合在一起作为基底材料;以及覆盖层(B),该覆盖层(B)由金属(X)形成在镀层上。独立权利要求还包括用于电连接电子部件的材料的方法。优选的特征:金属(X)是锡,金属(Y)是银,铜,锌,铋或铟。覆盖层(B)在镀层上由锡形成。

著录项

  • 公开/公告号DE10121774A1

    专利类型

  • 公开/公告日2002-02-21

    原文格式PDF

  • 申请/专利权人 FCM CO. LTD. OSAKA;

    申请/专利号DE20011021774

  • 发明设计人 MIURA SHIGEKI;

    申请日2001-05-04

  • 分类号H01L23/488;

  • 国家 DE

  • 入库时间 2022-08-22 00:27:00

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