首页> 外国专利> Semiconducting component has breakdown voltage between pot region, substrate lower than semiconducting element rated voltage, not higher than that of high voltage semiconducting element

Semiconducting component has breakdown voltage between pot region, substrate lower than semiconducting element rated voltage, not higher than that of high voltage semiconducting element

机译:半导体元件在锅区域之间具有击穿电压,基板低于半导体元件的额定电压,但不高于高压半导体元件的额定电压

摘要

The device has a semiconducting substrate, a high voltage semiconducting element in a pot region, a channel stopper region of higher impurity concentration than the pot region and a substrate region with higher impurity concentration than the substrate. The breakdown voltage between the pot region and substrate is lower than the semiconducting element rated voltage and not higher than that of the high voltage semiconducting element. The device has a semiconducting substrate (11) of first conductivity type, a pot region (12) of second conductivity type in the substrate containing a high voltage semiconducting element, a channel stopper region (13) of second conductivity type of higher impurity concentration than the pot region and a substrate region (14) of first conductivity type with higher impurity concentration than the substrate and at a distance from the channel stopper region so that breakdown voltage between the pot region and substrate is lower than the rated voltage of the semiconducting element and not higher than that of the high voltage semiconducting element.
机译:该器件具有半导体衬底,在电位器区域中的高压半导体元件,杂质浓度比电位器区域高的沟道停止区和杂质浓度比衬底高的基板区域。罐区和衬底之间的击穿电压低于半导体元件的额定电压,但不高于高压半导体元件的额定电压。该器件具有第一导电类型的半导体衬底(11),包含高压半导体元件的衬底中第二导电类型的电位锅区域(12),杂质浓度高于第二导电类型的沟道阻挡区域(13)罐区和第一导电类型的衬底区(14),其杂质浓度比衬底高,并且距沟道停止区有一定距离,因此罐区和衬底之间的击穿电压低于半导体元件的额定电压并且不高于高压半导体元件。

著录项

  • 公开/公告号DE10217935A1

    专利类型

  • 公开/公告日2002-10-24

    原文格式PDF

  • 申请/专利权人 FUJI ELECTRIC CO. LTD.;

    申请/专利号DE2002117935

  • 发明设计人 KITAMURA AKIO;

    申请日2002-04-22

  • 分类号H01L23/62;H01L29/78;

  • 国家 DE

  • 入库时间 2022-08-22 00:26:45

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