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Capacitance-Voltage Characteristics of Thin-film Transistors Fabricated with Solution-Processed Semiconducting Carbon Nanotube Networks

机译:溶液处理半导体碳纳米管网络制造的薄膜晶体管的电容-电压特性

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摘要

We report the capacitance-voltage (C-V) measurements on thin-film transistors (TFTs) using solution-processed semiconducting carbon nanotube networks with different densities and channel lengths. From the measured C-V characteristics, gate capacitance and field-effect mobility (up to ~50 cm2 V−1 s−1) of the TFTs were evaluated with better precision compared with the results obtained from calculated gate capacitance. The C-V characteristics measured under different frequencies further enabled the extraction and analysis of the interface trap density at the nanotube-dielectric layer interface, which was found to increase significantly as the network density increases. The results presented here indicate that C-V measurement is a powerful tool to assess the electrical performance and to investigate the carrier transport mechanism of TFTs based on carbon nanotubes.Electronic supplementary materialThe online version of this article (doi:10.1186/s11671-015-0999-8) contains supplementary material, which is available to authorized users.
机译:我们报告了使用不同密度和沟道长度的溶液处理半导体碳纳米管网络对薄膜晶体管(TFT)进行电容-电压(C-V)测量。从测得的CV特性,栅极电容和场效应迁移率(高达〜50 cm 2 V -1 s -1 )与从计算得出的栅极电容获得的结果相比,以更高的精度评估了TFT。在不同频率下测量的C-V特性进一步使得能够提取和分析纳米管-介电层界面处的界面陷阱密度,发现随着网络密度的增加,界面陷阱密度显着增加。此处显示的结果表明CV测量是评估电性能和研究基于碳纳米管的TFT的载流子传输机制的有力工具。电子补充材料本文的在线版本(doi:10.1186 / s11671-015-0999- 8)包含补充材料,授权用户可以使用。

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