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Back tile structure for a plasma visual display screen incorporating a dielectric layer of a porous oxide material to reduce the number of firing operations during fabrication
Back tile structure for a plasma visual display screen incorporating a dielectric layer of a porous oxide material to reduce the number of firing operations during fabrication
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机译:用于等离子体视觉显示屏的背砖结构,其包括多孔氧化物材料的介电层,以减少制造过程中的烧制次数
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摘要
A back tile structure for a plasma visual display screen has a substrate carrying a network of electric conducting electrodes, a dielectric layer, a network of barriers and a network of red, green and blue luminphores arranged between the barriers. A back tile structure for a plasma visual display screen has a substrate carrying a network of electric conducting electrodes, a dielectric layer, a network of barriers and a network of red, green and blue luminphores arranged between the barriers. The dielectric layer is made of a porous material composite of a powder with a granulometry of 0.4-10 microns or of an aerogel or of a mixture of the two with a thickness of 3-30 microns. The composition of the porous material is an oxide or mixture of oxides or solution of oxides. The oxides are chosen from those of silicon, aluminium, boron, phosphorus, calcium, magnesium, barium, titanium, zirconium, cerium, tin, vanadium, lead, bismuth, alkaline oxides, glasses of borosilicate or borophosphosilicate. Independent claims are also included for the fabrication of such a back tile and for a plasma visual display screen incorporating such a back tile.
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