Exposure system, exposure apparatus, application apparatus, developing device and method for controlling processing environment of substrate in exposure system

摘要

The present invention relates to an exposure system, an exposure apparatus, an application apparatus, a developing apparatus and a processing environment control method of a substrate in an exposure system used in a photolithography process in a manufacturing process of a micro device or a mask. The coating / developing device 11 and the exposure device 12 are connected through an interface device 13. The interface device (13) has a blower (52) for exhausting air in the delivery chamber (53) into the underfloor (54) of the clean room (14). Air in the unit chamber 39 in the coating and developing device 11 and the chambers 78, 65 to 67 in the exposure device 12 is exhausted to the underfloor 54 through the delivery chamber 53. Thereby, the pressure in each of the chambers (78, 65 to 67) of the exposure apparatus (12) can be prevented from increasing from the coating development device (11) to the exposure apparatus (12) without increasing the pressure in the unit chamber (39). This annoys each deviceAn accurate exposure operation can be realized while adjusting individual pressures and increasing the size of each device (11-13).