PROXIMITY EXPOSURE APPARATUS, METHOD FOR CONTROLLIPROXIMITY EXPOSURE APPARATUS, METHOD FOR CONTROLLING A SUBSTRATE TEMPERATURE IN THE PORXIMITY EXPOSUNG A SUBSTRATE TEMPERATURE IN THE PORXIMITY EXPOSURE APPARATUS AND METHOD OF MANUFACTURING A DISPLAYRE APPARATUS AND METHOD OF MANUFACTURING A DISPLAY PANEL SUBSTRATE PANEL SUBSTRATE

摘要

The invention discloses a proximity exposure apparatus, method for controlling the substrate temperature and method of manufacturing a panel substrate, the temperature of the substrate is effectively controlled in the proximity exposure apparatus. The substrate (1) is supported by using a chuck (10) in a body chamber (30), a mask (2) is supported by using a mask holder (20) and the chuck (10) is moved by using the platform. The clean air after the temperature adjustment is supplied transversely to the body chamber (30), on one hand, a suction inlet (41) arranged below the chuck (10) moves with the chuck (10), on the other hand, the air introduced into the body chamber (30) from the suction inlet (410 is discharged out of the body chamber (30). the air flowing to the transverse direction, along the surface of the substrate (1), is introduced to the suction inlet (41) below the chuck (10), even though the mask (2) is arranged above the substrate (1) close to the substrate (1), the clean air after temperature adjustment is supplied to the surface of the substrate (1).