首页> 外国专利> PROXIMITY EXPOSURE APPARATUS, METHOD FOR CONTROLLING A SUBSTRATE TEMPERATURE IN THE PORXIMITY EXPOSURE APPARATUS AND METHOD OF MANUFACTURING A DISPLAY PANEL SUBSTRATE

PROXIMITY EXPOSURE APPARATUS, METHOD FOR CONTROLLING A SUBSTRATE TEMPERATURE IN THE PORXIMITY EXPOSURE APPARATUS AND METHOD OF MANUFACTURING A DISPLAY PANEL SUBSTRATE

机译:接近曝光设备,用于控制接近曝光设备中的基板温度的方法以及制造显示面板基板的方法

摘要

PURPOSE: A proximity exposure apparatus, a method for controlling the temperature of a substrate of the proximity exposure apparatus, and a method for manufacturing a display panel substrate are provided to efficiently control the temperature of a substrate by exhausting air from the outside of the body house after the air inside a body house is suctioned. CONSTITUTION: A chuck(10) supports a substrate(1). A mask holder(20) supports a mask(2). The stage moves a chuck. A body house(30) receives the chuck, the mask holder, and the stage.
机译:目的:提供一种接近曝光设备,一种用于控制接近曝光设备的基板的温度的方法以及一种用于制造显示面板基板的方法,以通过从身体外部排出空气来有效地控制基板的温度。吸走车身内部的空气后组成:一个卡盘(10)支撑着一个基片(1)。口罩支架(20)支撑口罩(2)。舞台移动卡盘。车身(30)容纳卡盘,面罩保持器和平台。

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