DEVICE FOR CONTROLLING FILM FORMATION, FILM-FORMING APPARATUS, FILM-FORMING METHOD, METHOD FOR CALCULATING FILM THICKNESS FLOW FACTOR, AND PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a film-forming apparatus which can easily optimize a gas supply amount, and a device for controlling film formation.;SOLUTION: This film-forming method comprises estimating a relationship between the flow rate of the reaction gas supplied from several pipes and a growth rate of the film on a substrate, and controlling the flow rate of the reaction gas supplied from the several pipes, to form the film. By estimating the relationship between the flow rate and film thickness, the film thickness can be easily approached to a target value. The relationship can be estimated by using, for example, a linear approximation model which linearly approximates the relationship between the flow rate of the gas and the growth rate of the film on the above substrate.;COPYRIGHT: (C)2003,JPO