首页> 外国专利> SEMICONDUCTOR LASER AND ITS MANUFACTURING METHOD, SEMICONDUCTOR LIGHT EMITTING ELEMENT AND ITS MANUFACTURING METHOD, SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD, SEMICONDUCTOR STRUCTURE AND ITS MANUFACTURING METHOD, ELECTRONIC DEVICE AND ITS MANUFACTURING METHOD AND STRUCTURE AND ITS MANUFACTURING METHOD

SEMICONDUCTOR LASER AND ITS MANUFACTURING METHOD, SEMICONDUCTOR LIGHT EMITTING ELEMENT AND ITS MANUFACTURING METHOD, SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD, SEMICONDUCTOR STRUCTURE AND ITS MANUFACTURING METHOD, ELECTRONIC DEVICE AND ITS MANUFACTURING METHOD AND STRUCTURE AND ITS MANUFACTURING METHOD

机译:半导体激光器及其制造方法,半导体发光元件及其制造方法,半导体装置及其制造方法,半导体结构及其制造方法,电子装置及其制造方法

摘要

PROBLEM TO BE SOLVED: To upgrade an end face of a resonator formed by cleavage or the flatness of the end face even when the cleavage of a substrate is poor.;SOLUTION: When a semiconductor laser using a III-V nitride compound semiconductor is manufactured, III-V nitride compound semiconductor layers 2, 3 are grown on different types of substrates such as, for example, a sapphire substrate 1, and then a part near the forming position of the end face of the resonator of the layers 2, 3 is separated from the substrate 1 by irradiating the substrate with an ultraviolet laser beam. Then, the layers 2, 3 are cleaved together with the substrate 1 to thereby form the end face of the resonator.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:即使在基板的解理性差的情况下,也可以提高由解理形成的谐振器的端面或端面的平坦度。解决方案:制造使用III-V族氮化物化合物半导体的半导体激光器在不同类型的衬底上,例如蓝宝石衬底1上,生长III-V族氮化物化合物半导体层2、3,然后在层2、3的谐振器的端面的形成位置附近的部分上生长。通过用紫外线激光束照射衬底,将衬底1与衬底1分离。然后,将层2、3与基板1一起劈开,从而形成谐振器的端面。版权所有:(C)2004,JPO

著录项

  • 公开/公告号JP2003304021A

    专利类型

  • 公开/公告日2003-10-24

    原文格式PDF

  • 申请/专利权人 SONY CORP;

    申请/专利号JP20020110343

  • 发明设计人 ASANO TAKEHARU;

    申请日2002-04-12

  • 分类号H01S5/02;H01S5/323;

  • 国家 JP

  • 入库时间 2022-08-22 00:18:50

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