首页> 外国专利> METHOD FOR PRODUCING LIQUID DROP EJECTION HEAD, LIQUID DROP EJECTION HEAD, INK CARTRIDGE EMPLOYING LIQUID DROP EJECTION HEAD, AND INK JET PRINTER

METHOD FOR PRODUCING LIQUID DROP EJECTION HEAD, LIQUID DROP EJECTION HEAD, INK CARTRIDGE EMPLOYING LIQUID DROP EJECTION HEAD, AND INK JET PRINTER

机译:液体滴头的制造方法,液体滴头,使用液体滴头的墨盒以及喷墨打印机

摘要

PROBLEM TO BE SOLVED: To provide a method for producing an ink jet head at a low cost by taking advantage of anisotropic etching capable of micromachining a silicon single crystal substrate with high accuracy and sand blast etching for boring holes through the silicon substrate.;SOLUTION: In the method for producing an ink jet head comprising a nozzle plate 1 provided with a plurality of nozzles 2, a channel plate 3 provided with tubes 6 communicating with the nozzles 2 and pressurized liquid chambers 4, and a diaphragm 7 for pressurizing liquid in the pressurized liquid chamber 4, the channel plate 3 is formed of a silicon substrate having a face orientation of (100). In a first process, a silicon nitride film is formed as a mask pattern from the pressurized liquid chamber side and anisotropic wet etching is performed at a depth required for the pressurized liquid chamber 4. In this regard, the interconnecting tube 6 part is also processed. In a second process, sand blast etching is performed from the nozzle surface side in a mask pattern formed of a dry film and then through holes communicating with the pressurized liquid chambers are made thus completing the ink jet head.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种利用各向异性刻蚀的优势以低成本制造喷墨头的方法,该各向异性刻蚀能够以高精度对单晶硅基板进行微加工,并且通过喷砂刻蚀在硅基板上钻孔。 :在一种制造喷墨头的方法中,该喷墨头包括:喷嘴板1,其具有多个喷嘴2;通道板3,其具有与喷嘴2连通的管6和加压液体室4;以及用于对液体进行加压的隔膜7。在加压液体室4中,通道板3由面取向为(100)的硅基板形成。在第一步骤中,从加压液体室侧形成氮化硅膜作为掩模图案,并且在加压液体室4所需的深度处进行各向异性湿蚀刻。在这方面,还处理互连管6部分。 。在第二步骤中,以干膜形成的掩模图案从喷嘴表面侧进行喷砂蚀刻,然后形成与加压液室连通的通孔,从而完成喷墨头。;版权所有:(C)2003 ,日本特许厅

著录项

  • 公开/公告号JP2003276206A

    专利类型

  • 公开/公告日2003-09-30

    原文格式PDF

  • 申请/专利权人 RICOH CO LTD;

    申请/专利号JP20020081533

  • 发明设计人 TOYODA GENJIRO;

    申请日2002-03-22

  • 分类号B41J2/16;

  • 国家 JP

  • 入库时间 2022-08-22 00:17:47

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