BASE MATERIAL ON WHICH PATTERN IS FORMED AND ITS METAL MOLD, OPTICAL PICKUP DEVICE, ELECTRON BEAM LITHOGRAPHY, BASE MATERIAL ON WHICH PATTERN IS FORMED BY THE SAME METHOD, AND ELECTRON BEAM LITHOGRAPHIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a base material on which patterns are formed which can reduce surface reflection without forming any dielectric film and prevent a pickup function from decreasing and its metal mold, an optical pickup device, an electron beam lithography, a base material drawn thereon by the method, and an electron beam lithographic device.;SOLUTION: The base material on which patterns are formed by being scanned with an electron beam. When at least a one-pitch part of a diffraction grating is obliquely formed at a curved-surface part of the base material and a plurality of hole parts for surface reflection prevention are formed in the slanting part of the one-pitch part, on the curved-surface part of the base material patterns are formed while a dosage is computed according to characteristics of a dosing distribution where a dosage distribution for scanning positions is predefined having the dosage of the hole parts taken into consideration. Consequently, the base material can be provided which has the plurality of hole parts for surface reflection prevention.;COPYRIGHT: (C)2003,JPO