ELECTROPOLISHING LIQUID, METHOD FOR ELECTROPOLISHING COPPER, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an electropolishing liquid for precisely and stablly electropolishing copper, a method for electropolishing copper with the use of the electropolishing liquid, and a method for manufacturing a semiconductor device.;SOLUTION: The electropolishing liquid for electropolishing copper includes a copper ion. The method for electropolishing copper is characterized by making the electropolishing liquid containing the copper ion exist between a material to be polished of an anode and a cathode, and electrolytically treating the material. The method for manufacturing the semiconductor device, which electropolishes metallic wires including copper, is characterized by making the electropolishing liquid containing the copper ion exist between the material to be polished of the anode and the cathode, and electrolytically treating the material.;COPYRIGHT: (C)2004,JPO