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GaN-BASED SEMICONDUCTOR BASE

机译:Gan-based semiconductor base

摘要

PROBLEM TO BE SOLVED: To provide a base, where an AlGaN crystal layer having reduced dislocation density is grown, even while an LEPS method is being used.;SOLUTION: Irregularities, where the LEPS method can be carried out, are machined on the surface of a crystal substrate 1, and a GaN-based crystal layer 2 is grown from the recess or projection. At this point, AlGaN layers 21, 23, 25, and 27, where an Al composition is small and AlGaN layers 22, 24, 26, and 28 where the Al composition is large are alternately grown as a lamination structure, and at the same time, they are grown, until an upper surface becomes flat. As a result, growth is made preferentially by the LEPS method while being AlGaN, and an AlGaN crystal layer is achieved.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种基底,即使使用LEPS方法,也能生长出位错密度降低的AlGaN晶体层。解决方案:可以在表面上加工出可以进行LEPS方法的不规则性在晶体基板1的内部,从凹部或凸部生长GaN基晶体层2。此时,交替地生长Al组成小的AlGaN层21、23、25和27以及Al组成大的AlGaN层22、24、26和28作为层叠结构。时间长了,直到上表面变平。结果,在成为AlGaN的同时,优先通过LEPS方法进行生长,并获得了AlGaN晶体层。;版权所有:(C)2003,JPO

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