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A Systematic Study of the Thermoelectric Properties of GaN-based Wide Band Gap Semiconductors

机译:GaN基宽带隙半导体热电性能的系统研究

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摘要

In this paper the thermoelectric properties-the Seebeck coefficient, the electrical conductivity and the power factor - of GaN and InGaN thin films grown by Metal Organic Vapor Deposition (MOCVD) are reported. The Seebeck coefficient and power factor of InGaN decreases with increasing indium content, although the electrical conductivity shows an inverse behavior. P-type doped samples demonstrated the highest Seebeck coefficient (637 μV/K in GaN:Mg, 1200 μV/K in InGaN:Mg) but the lowest power factor (01×10~(-4) W/m-K for GaN:Mg, 0.4×10~(-4)W/m-K for InGaN:Mg). The Seebeck coefficient of the doped GaN thin films decreased linearly with log of the carrier concentration. GaN:Si exhibited a maximum power factor of 9.1×10~(-4) W/m-K with a carrier concentration of 1.6×10~(18) cm~(-3), and In_(0.1)Ga_(0.9)N exhibited a maximum power factor of 109×l0~(-4) W/m-K with a carrier concentration of 1.2×10~(18) cm~(-3). The results also indicate that GaN and InGaN-based materials could potentially be useful materials for TE applications at high temperatures.
机译:本文报道了通过金属有机气相沉积(MOCVD)生长的GaN和InGaN薄膜的热电特性-塞贝克系数,电导率和功率因数-。 InGaN的塞贝克系数和功率因数随铟含量的增加而降低,尽管电导率表现出相反的行为。 P型掺杂样品的塞贝克系数最高(GaN:Mg为637μV/ K,InGaN:Mg为1200μV/ K),而功率因数最低(GaN:Mg为01×10〜(-4)W / mK (对于InGaN:Mg为0.4×10〜(-4)W / mK)。掺杂的GaN薄膜的塞贝克系数随载流子浓度的对数线性下降。 GaN:Si的最大功率因数为9.1×10〜(-4)W / mK,载流子浓度为1.6×10〜(18)cm〜(-3),In_(0.1)Ga_(0.9)N最大功率因数为109×l0〜(-4)W / mK,载流子浓度为1.2×10〜(18)cm〜(-3)。结果还表明,基于GaN和InGaN的材料可能是高温TE应用的有用材料。

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  • 来源
  • 会议地点 Boston MA(US);Boston MA(US)
  • 作者单位

    Department of Electrical and Computer Engineering, University of North Carolina at Charlotte,9201 University City Blvd, Charlotte, NC 28223, U.S.A.;

    Department of Electrical and Computer Engineering, University of North Carolina at Charlotte,9201 University City Blvd, Charlotte, NC 28223, U.S.A.;

    Department of Electrical and Computer Engineering, University of North Carolina at Charlotte,9201 University City Blvd, Charlotte, NC 28223, U.S.A.;

    Department of Electrical and Computer Engineering, University of North Carolina at Charlotte,9201 University City Blvd, Charlotte, NC 28223, U.S.A.,Lighting Research Development Center, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;

    Department of Engineering Technology and Construction Management, University of North Carolina at Charlotte, 9201 University City Blvd, Charlotte, NC 28223, U.S.A.;

    Department of Electrical and Computer Engineering, University of North Carolina at Charlotte,9201 University City Blvd, Charlotte, NC 28223, U.S.A.;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 材料;材料;
  • 关键词

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