METHOD AND APPARATUS FOR ANALYZING IMPURITY IN TANTALUM-BASED MATERIAL, AND TANTALUM OXIDE POWDER

摘要

PPROBLEM TO BE SOLVED: To provide an analysis method and an analysis apparatus of impurities in a tantalum-based material for continuously and accurately analyzing all of an extremely small amount of impurities and simply automating the analysis, and to provide tantalum oxide powder. PSOLUTION: In the analysis method of impurities in a tantalum-based material for determining the quantity of impurities in the tantalum-based material by a flow injection analysis method, a process is provided where a channel 10 for continuously feeding eluent to columns 32 and 33 where an anion ion exchange resin is filled is formed, a tantalum-based material solution sample is injected into the upstream side of the columns 32 and 33, impurities in the impurities other than tantalum in the tantalum-based material solution sample are eluated by the anion ion exchange resin, and the quantity of impurities contained in eluate that is continuously eluted from the column concerned is determined by an induction coupling plasma mass spectroscope 40. The quantity- determining process is repeated at least for two times by changing the conditions of the induction coupling plasma mass spectroscope. PCOPYRIGHT: (C)2003,JPO