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GaN-BASED SEMICONDUCTOR FILM, METHOD FOR MANUFACTURING THE SAME, SEMICONDUCTOR LIGHT-EMITTING DIODE

机译:GaN基半导体膜,制造相同的半导体发光二极管的方法

摘要

PROBLEM TO BE SOLVED: To provide a GaN-based semiconductor, and a method for manufacturing the same, equipped with a novel structure effectively usable for improvement on the luminescence property of semiconductor light emitting diodes using a GaN-based semiconductor.;SOLUTION: Use of crystal surfaces yet nonplanar in a GaN-based semiconductor film selective growth process for the irregular reflection of light improves light ejection efficiency. Non-flat boundaries are formed in between a 1st GaN- based semiconductor 13 and a 2nd GaN-based semiconductor 12, and in between the 2nd GaN-based semiconductor 12 and a 3rd GaN-based semiconductor 11.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种GaN基半导体及其制造方法,其配备有有效地用于改善使用GaN基半导体的半导体发光二极管的发光性能的新颖结构。对于光的不规则反射而言,在基于GaN的半导体膜选择性生长工艺中,晶体表面的非平坦性提高了光发射效率。在第一GaN基半导体13与第二GaN基半导体12之间以及在第二GaN基半导体12与第三GaN基半导体11之间形成非平坦边界。版权所有:(C)2003 ,日本特许厅

著录项

  • 公开/公告号JP2003158295A

    专利类型

  • 公开/公告日2003-05-30

    原文格式PDF

  • 申请/专利权人 SHOWA DENKO KK;

    申请/专利号JP20010356801

  • 发明设计人 URASHIMA YASUHITO;

    申请日2001-11-22

  • 分类号H01L33/00;C23C16/34;C30B29/38;H01L21/205;

  • 国家 JP

  • 入库时间 2022-08-22 00:14:05

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