METHOD FOR MANUFACTURING MAGNETO-RESISTANCE EFFECT THIN-FILM MAGNETIC HEAD, AND THE MAGNETO-RESISTANCE EFFECT THIN-FILM MAGNETIC HEAD

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a new MR thin-film head of a lead-overlaid structure wherein a highly accurate narrow reproducing track with is provided, and manufacturing process time is not increased, and the MR thin-film head. ;SOLUTION: In the method for manufacturing an MR thin-film magnetic head where a first lead conductor layer 24 and a second lead conductor layer 26 are arranged to be overlapped on an MR film 13, a first lead conductor layer 24 is formed at least on the MR film 13, a patterned cap layer 25 is formed on this conductor layer and, by using the patterned cap layer 25 as a mask, dry etching is carried out by A_r gas and O₂ gas, O₂ gas or N₂ gas to pattern the conductor layer, thereby forming the first lead conductor layer 24.;COPYRIGHT: (C)2003,JPO