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Antireflective silicon-containing compositions as hardmask layer
Antireflective silicon-containing compositions as hardmask layer
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机译:抗反射的含硅组合物作为硬掩模层
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摘要
Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.
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