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Method and apparatus for using phase shifter cutbacks to resolve phase shifter conflicts
Method and apparatus for using phase shifter cutbacks to resolve phase shifter conflicts
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机译:使用移相器削减来解决移相器冲突的方法和装置
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摘要
One embodiment of the invention provides a method and a system for using phase shifter cutbacks to resolve conflicts between phase shifters during creation of a mask to be used in an optical lithography process for manufacturing an integrated circuit. The system works by locating a plurality of phase shifters, including a first phase shifter and a second phase shifter, on a phase shifting mask, and then identifying a conflict area wherein a conflict is likely to occur between the first phase shifter and the second phase shifter on the phase shifting mask. The system resolves this conflict by cutting back one or both of the first phase shifter and the second phase shifter, so that the first phase shifter and the second phase shifter do not interfere with each other in the conflict area.
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