首页> 外国专利> METHOD FOR MANUFACTURING AN INTEGRATED CIRCUIT HAVING A PARTICULAR FUNCTIONALITY REQUIRED BY A USER OF THE CIRCUIT AND HAVING FIRST STRUCTURES TO PRODUCE THE PARTICULAR FUNCTIONALITY AND SECOND STRUCTURES

METHOD FOR MANUFACTURING AN INTEGRATED CIRCUIT HAVING A PARTICULAR FUNCTIONALITY REQUIRED BY A USER OF THE CIRCUIT AND HAVING FIRST STRUCTURES TO PRODUCE THE PARTICULAR FUNCTIONALITY AND SECOND STRUCTURES

机译:制造具有电路用户所要求的特定功能并具有第一结构以产生特定功能和第二结构的集成电路的方法

摘要

An integrated circuit has first structures that are produced in a plurality of wiring planes using exposure masks and serve for producing a functionality required by the user of the circuit. The circuit also has second structures that are produced in a plurality of the wiring planes using the exposure masks and do not serve for the particular functionality, but rather for the capability of checking if the exposure masks used belonged to a common mask set.
机译:集成电路具有第一结构,该第一结构使用曝光掩模在多个布线平面中产生,并且用于产生电路用户所需的功能。该电路还具有第二结构,该第二结构使用曝光掩模在多个布线平面中产生,并且不用于特定功能,而是用于检查所使用的曝光掩模是否属于公共掩模组的能力。

著录项

  • 公开/公告号US6514780B2

    专利类型

  • 公开/公告日2003-02-04

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号US20000732136

  • 发明设计人 ZOLTAACUTE;N MAACUTE;NYOKI;

    申请日2000-12-07

  • 分类号H01L216/60;

  • 国家 US

  • 入库时间 2022-08-22 00:04:30

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