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Method of designing/manufacturing semiconductor integrated circuit device using combined exposure pattern and semiconductor integrated circuit device
Method of designing/manufacturing semiconductor integrated circuit device using combined exposure pattern and semiconductor integrated circuit device
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机译:使用组合曝光图案设计/制造半导体集成电路器件的方法和半导体集成电路器件
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摘要
In a method of designing/manufacturing a plurality of semiconductor integrated circuit devices having built-in ROMs each storing different data on a single wafer, a ROM pattern is formed in combination with a pattern that is common to a plurality of semiconductor integrated circuit devices other than the ROM pattern.
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