Photocurable resist inks

摘要

An epoxy compound for use in a photocurable mixed resist ink is obtainable by a process comprising the steps of a) reacting a hydroxyl compound having a hydroxy group with a carboxylic anhydride; and b) reacting the product of step a) with an epoxy novolac. Also provided is a photocurable prepolymer obtainable by a process comprising the steps of a) reacting an epoxy resin having terminal epoxy groups with an ethylenically unsaturated carboxylic acid; b) reacting the product of step a) with one or more carboxylic anhydrides; and c) reacting the product of step b) with an ethylenically unsaturated monofunctional epoxy monomer.