Limiting and selfuniforming cathode currents through the microtips of a field emission flat panel display

摘要

A pixel emission current limiting resistance is realized by forming a stack of alternately doped amorphous or polycrystalline silicon layers over the cathodic conductors of a FED driving matrix. The stack of amorphous or polycrystalline silicon layers doped alternately n and p provides at least a reversely biased n/p junction having a leakage current that matches the required level of pixel emission current. The reversely biased junction constitutes a nonlinear series resistance that is quite effective in limiting the emission current through anyone of the microtips that form an individually excitable pixel and which are formed on the uppermost layer of the stack.