METHOD OF FORMING TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE FILM, GLASS SUBSTRATE HAVING THE SAME AND PHOTOELECTRIC TRANSDUCTION UNIT INCLUDING THE GLASS SUBSTRATE

摘要

A method of forming a transparent conductive film constituted mainly of tin oxide on a glass ribbon according to the generally known online CVD process, wherein a transparent conductive film of low carbon content, namely, low absorption coefficient at 400 to 550 nm wavelength is formed while preventing the generation of giant crystal grains of tin oxide. In particular, a method of forming a transparent conductive film constituted mainly of tin oxide on a glass ribbon according to the CVD process, wherein a transparent conductive film is formed at a film formation rate of 3000 to 7000 nm/min from a feed gas containing an organotin compound in an amount of 0.5 to 2.0 mol%.