首页> 外国专利> METHOD OF FORMING TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE FILM, GLASS SUBSTRATE HAVING THE SAME AND PHOTOELECTRIC TRANSDUCTION UNIT INCLUDING THE GLASS SUBSTRATE

METHOD OF FORMING TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE FILM, GLASS SUBSTRATE HAVING THE SAME AND PHOTOELECTRIC TRANSDUCTION UNIT INCLUDING THE GLASS SUBSTRATE

机译:形成透明导电膜的方法,透明导电膜,具有相同结构的玻璃基质以及包括玻璃基质的光电转换单元

摘要

The present invention presents a method for forming a transparent conductive film whose principal component is tin oxide by so-called CVD on a glass ribbon, preventing the generation of giant crystal grains in the tin oxide, while ensuring that the concentration of carbon is low, or in other words, the absorption coefficient at 400 to 550 nm wavelength is low. In accordance with the invention, the method for forming a transparent conductive film whose principal component is tin oxide by CVD on a glass ribbon includes forming the transparent conductive film at a film deposition speed of 3000 to 7000 nm/min using a raw material gas including 0.5 to 2.0 mol% of an organic tin compound.
机译:本发明提出了一种通过在玻璃带上通过所谓的CVD形成主要成分为氧化锡的透明导电膜的方法,该方法防止了氧化锡中产生大晶粒,同时确保了碳的浓度低,换句话说,在400至550nm波长处的吸收系数低。根据本发明,在玻璃带上通过CVD形成主要成分为氧化锡的透明导电膜的方法包括:使用包含以下物质的原料气体,以3000〜7000nm / min的成膜速度形成透明导电膜。 0.5至2.0摩尔%的有机锡化合物。

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