Polymer with a pericyclic protective group and resist composition containing the same

摘要

The present invention relates to a polymer having at least one pericyclic protective group, such as 2-methyl-2-bicyclo [2,2,1] heptanyl. Resist compositions comprising polymers can be used as chemically strengthened resists and have strong etch resistance. In addition, by using such a resist composition, it is possible to successfully form a fine pattern of 0.1 μm pitch.