TARGET FOR CATHODE DISCHARGING ARC ION PLATING AND METHOD OF MANUFACTURING THE SAME

摘要

In a target for cathode discharging arc ion plating containing Al and Cr as an essential ingredient according to the invention, the thickness of the Al and Cr compound layer formed between Cr particles and Al contained in a target is 30 mu m or less. Alternatively, the total for the peak intensities of Al-Cr compound observed between diffraction angles between 10 to 80 DEG by X-ray diffractiometry according to &thetas; = 2&thetas; method is 10% or less relative to the total for the peak intensities of Al, Cr and the Al-Cr compound. Further, the relative density of the target is 92% or more. The target is capable of forming hard films of high quality while preventing not uniform movement of arc spots and suppressing formation of macro particles. IMAGE