TARGET FOR CATHODE DISCHARGING ARC ION PLATING AND METHOD OF MANUFACTURING THE SAME

摘要

The present invention relates to a cathode discharging arc ion plating target containing Al and Cr as an essential component, the Al and Cr compound layer formed between the Cr particles and Al contained in the target is less than the thickness 30㎛. In addition, the sum of the peak intensities of Al-Cr compound observed at 10 to 60 ° of the diffraction angle by the X- ray diffraction according to the θ-2θ method using a CuKα is the sum of the peak intensities of Al, Cr and the Al-Cr compound with respect to the more than 10%. In addition the relative density of the target is 92% or more. Target according to the present invention can form a hard film having a high quality while preventing the movement of the arc spot a non-uniform and suppressing the formation of macro particles.