首页> 外国专利> Lateral pin diode and manufacturing process has separated p and n regions on a substrate with a region of lower dopant concentration between them

Lateral pin diode and manufacturing process has separated p and n regions on a substrate with a region of lower dopant concentration between them

机译:横向pin二极管及其制造工艺将衬底上的p和n区域分开,它们之间的掺杂剂浓度较低

摘要

A process for making a lateral PIN diode comprises forming separated p (16) and n (18) regions on a substrate (14) and forming between these on the substrate a region (20) having a lower dopant concentration than either the p- or n- region. An Independent claim is also included for a PIN diode formed as above.
机译:制作横向PIN二极管的方法包括在衬底(14)上形成分离的p(16)和n(18)区域,并在衬底之间在这些区域之间形成掺杂浓度比p或p或p更低的区域(20)。 n-区域。对于上述形成的PIN二极管也包括独立权利要求。

著录项

  • 公开/公告号DE10127952A1

    专利类型

  • 公开/公告日2002-12-19

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE20011027952

  • 发明设计人 SENG PHILIPP;PEICHL RAIMUND;

    申请日2001-06-08

  • 分类号H01L29/868;H01L21/329;

  • 国家 DE

  • 入库时间 2022-08-21 23:43:01

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