首页> 外国专利> Halftone phase shift mask blank for halftone phase shift mask manufacture, has phase shifter film to shift phase of transmitted light by predetermined quantity simultaneously, when portion of exposed light is transmitted

Halftone phase shift mask blank for halftone phase shift mask manufacture, has phase shifter film to shift phase of transmitted light by predetermined quantity simultaneously, when portion of exposed light is transmitted

机译:用于半色调相移掩模制造的半色调相移掩模坯料,具有相移膜,用于在部分曝光的光透射时同时使透射光的相移预定量

摘要

A phase shifter film containing silicon, oxygen and nitrogen shifts the phase of a transmitted light by a predetermined quantity simultaneously, when a portion of exposed light is transmitted, so that the light transmitted through the light transmission region and phase shifter region are canceled by each other. Independent claims are also included for the following: (1) halftone phase shift mask; and (2) halftone phase shift mask manufacturing method.
机译:当透射一部分曝光的光时,包含硅,氧和氮的相移膜同时使透射光的相位偏移预定量,从而使透射过光透射区域和相移区域的光彼此抵消。其他。还包括以下方面的独立权利要求:(1)半色调相移掩模; (2)半色调相移掩模的制造方法。

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