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European conference on mask technology for integrated circuits and microcomponents

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1.Improvement of temperature uniformity during prebake process in mask blank production

机译：掩盖空白生产中预烘焙过程中温度均匀性的提高
- 作者：F;Andreas Bensberg;Ute Buttgereit;Fredi Schubert;Bernd Beier
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
2.Mask Definition by Nanoimprint Lithography

机译：纳米压印光刻的掩模定义
- 作者：H.-C. Scheer;D. Lyebyedyev
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
3.The compact excimer laser - light source for optical (mask) inspection systems

机译：用于光学（掩模）检查系统的紧凑型准分子激光源
- 作者：Heinz Huber;Tobias Pflanz
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
4.Application of E-beam chemically amplified resist to devices below 0.18 μm node

机译：将E-束的应用化学放大抗蚀剂在0.18μm节点以下的装置
- 作者：Jung-Min Sohn;Woo-Sung Han;Sung-Woon Choi;Chang-Hwan Kim;Chan-Uk Jeon
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
5.130 nm Node Mask Development

机译：130 NM节点掩码开发
- 作者：Damon Cole;Nam-Wook Kim;Maiying Lu;David Alexander;Suzanne Weaver;Jan M. Chabala
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
- electron beam;
- CD uniformity;
- GHOST;
- MPG-II;
- MPG;
- multipass gray;
- photomask;
6.Strategies for Wafer-Scale Hot Embossing Lithography

机译：晶圆级热压印光刻的策略
- 作者：D. Lyebyedyev;H. Schulz;H.-C. Scheer
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
7.Establishment of Production Process and Assurance Method for Alternating Phase Shift Masks

机译：建立制备过程和保证方法的交替相移掩模
- 作者：Hiroyuki Miyashita;Yasutaka Morikawa;Morihisa Hoga;Hidetaka Saitou;Tatsuhiko Kamibayashi;Yasuhiro Koizumi;Shiaki Murai
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
- alternating phase shift mask;
- AIMS simulation;
- quartz etching process;
- phase-defect detection;
8.Challenges and Opportunities for EPL and EUVL Masks

机译：EPL和EUVL Masks的挑战和机遇
- 作者：Pawitter Mangat
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
9.Electron-beam Lithography Data Preparation based on Multithreading MGS/PROXECCO

机译：基于多线程MGS / Proxecco的电子束光刻数据准备
- 作者：M;H. Eisenmann;N. Belic;Dr. U. Baetz;B. Buerger;J. Gramss;M. Lemke;H. Eichhorn
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
- data preparation;
- leica ZBA;
- PROXECCO multithreading;
- MGS;
- proximity effect correction;
- e-beam;
10.Photomask blanks quality and functionality improvement challenges for the 130nm node and beyond

机译：Photomask空白质量和功能改善了130nm节点及更远的挑战
- 作者：Kunihiko Ueno;Masao Ushida;Hideo Kobayashi
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
11.High-resolution inspection of 2D-microstructures using multi-mode Dolarization microscopy polarization microscopy

机译：使用多模偏振显微镜偏振显微镜的2D微结构的高分辨率检查
- 作者：Hans Tiziani;Harald Jacobsen;Michael Totzeck
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
12.Resistless electron beam lithography technique for the fabrication of X-ray masks

机译：用于制造X射线面罩的无抗抗抗抗纤维电子束光刻技术
- 作者：Jacques Beauvais;Dominique Drouin;Eric Lavallee
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
13.Progress in placement control for ion beam stencil mask technology

机译：离子束模板掩模技术的放置控制进展
- 作者：A.;I.W. Rangelow;M. Kratzenberg;J. Voigt;E. Haugeneder A. Degen;R. Springer;F. Letzkus;J. Butschke;K. Kragler;T. Struck;A. Ehrmann;F.-M. Kamm
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
14.The Canary Reticle- A New Diagnostic for Reticles and a Window into the Physics of ESD Damage to Reticles

机译：本金丝雀掩盖 - 用于栓塞和窗口的新诊断和窗口的窗口损坏的灯具
- 作者：Andreas Englisch;Andreas Englisch;Larry Levit
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
15.Charged Particle Beam Induced Processes and its Applicability to Mask Repair for Next Generation Lithographies

机译：带电粒子束诱导的工艺及其对下一代石棉修复的适用性
- 作者：Hans W.P. Koops
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
16.Investigation of Quartz Etch Rate Uniformity for Alternating Phase Shift Mask Applications Utilizing a Next Generation ICP Source

机译：用于使用下一代ICP源的交替相移掩模应用的石英蚀刻速率均匀性
- 作者：C.;R. Westerman;JPlumhoff;C. Constantine;C. Strawn
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
17.Study of Removal Process for Buffer Layer on Multilayer of EUVL Mask

机译：EUVL掩模多层缓冲层去除过程研究
- 作者：Shinji Okazaki;Masaaki Ito;Byoung-Taek Lee;Akira Chiba;Naoya Hirano;Hiromasa Yamanashi;Hiromasa Hoko;Masashi Takahashi;Taro Ogawa;Eiichi Hoshino
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
18.First Results from a New 248 nm CD Measurement System for Future Mask and Reticle Generation

机译：来自新的248 nm CD测量系统的首先结果，用于未来面具和掩模版生成
- 作者：Hans-Juergen Brueck;Sigrid Lehnigk;Juergen Helbing;Gerd Scheming;Gerhard Schlueter
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
19.Comparison of linewidth measurements on COG masks

机译：齿轮蒙皮测量的比较
- 作者：W.;S. Lehnigk;H.-J. Brueck;C.G. Frase;W. Mirande;H. Bos se
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
20.Mask manufacturing contribution on 248nm 193nm lithography performances

机译：248nm＆193nm光刻性能的面具制造贡献
- 作者：G.;Y. Quere;M. Tissier;J-C Richoilley;G.Fanget;A.Barberet
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
- mask manufacturing;
- MEEF;
- AFLV;
- linearity;
- 193nm-lithography;
- 248nm-lithography;
21.Continuous Image Writer with improved image quality for high accuracy optical patterning

机译：连续图像作者，具有改进的高精度光学图案的图像质量
- 作者：Tim Koerner;Stefan Brunn;Joerg Paufler
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
22.Defect inspection of IPL stencil masks with a KLA 351 tool

机译：用KLA 351工具缺陷IPL钢板纸板罩的缺陷检查
- 作者：Rene Redemann;Annika Eisner;Albrecht Ehrmann
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
23.Doubly exposed patterning characteristics using two alternating phase shift masks

机译：使用两个交替相移掩模的双重暴露的图案化特性
- 作者：Jung- Min Sohn;Hee-Sun Yoon;Woo-Sung Han;Seong-Woon Choi;Yong-Hoon Kim;In-Gyun Shin;Sung-Woo Lee
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
24.Phase Defect Inspection of 130 nm Node Phase Shift Masks Using a Simultaneous Transmitted and Reflected Light Pattern Inspection Algorithm

机译：使用同时传输和反射光图案检查算法的130nm节点相移掩模的相位缺陷检查
- 作者：D;Mario Hennig;Manuel Vorwerk;U.A. Griesinger;C. Crell;M. Prudhomme;M. Wihl;M. Rudzinski;D. Emery;L. Zurbrick
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
25.AutoMOPS: B2B and B2C in mask making: Mask manufacturing performance and customer satisfaction improvement through better information flow management

机译：Automops：B2B和B2C在掩模制作：通过更好的信息流量管理掩模制造性能和客户满意度改善
- 作者：Aart Kuijken;Ben Rodriguez;Olaf Filies;Luc de Ridder
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
26.Improved throughput in the ALTA～R 3000 IC mask writing system

机译：提高ALTA〜R 3000 IC面具写入系统的吞吐量
- 作者：Daniel Sprenkel;Jay P. Daniel;H. Christopher Hamaker;Vishal Garg;Gregory E. Valentin
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
- critical dimension;
- throughput;
- linewidth uniformity;
- multipass printing;
- reticle writers;
27.Study of mask aerial images to predict CD proximity and line end shortening of resist patterns

机译：面罩空中图像的研究预测CD接近和线结束抗蚀模式的缩短
- 作者：J;Bo So;Andrew Ridley;Judith van Praagh;Mircea Dusa
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年
- resolution enhancement technique;
- end-of-line pullback;
- overlapped ED windows;
- aerial image;
- quasar and Annular apertures;
- off-axis illumination;
- NA;
- RET;
28.Quality Assessment of Advanced Photomasks Using the Q-CAP Cluster Tool

机译：使用Q-CAP集群工具对高级光掩模的质量评估
- 作者：Tho;Hans Hartmann;Karl Somrner;Yair Eran;Thomas Engel;Gerd Scheming;Hans-Juergen Brueck;Corinne Miramond;Emanuele Baracchi;Gerald Galan;Martin Verbeek;Roman Liebe;Volodymyr Ordynskyy;Thomas Schaetz;Kai Peter
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2001年