Optical system for microlithography, has optical retarding system placed between two optical subsystems and includes optical retarding unit of one-half of wavelength between two mutually orthogonal states of polarization

摘要

The system has two optical subsystems (3,5), with each subsystem having two birefringent optical units (7,9). An optical retarding system (13) with an optical retarding unit (15) is arranged between the two optical subsystems. The optical retarding unit e.g. a half-wave plate introduces a retardation of one-half of a wavelength between two mutually orthogonal states of polarization. An Independent claim is also included for a method of producing an optical system.