首页> 外国专利> SURFACE COATED CERMET CUTTING TOOL HAVING EXCELLENT HARD COATED LAYER EXERTING DISPLACING EXCELLENT CHIPPING RESISTANCE UNDER HIGH SPEED AND DEEP CUTTING CONDITION

SURFACE COATED CERMET CUTTING TOOL HAVING EXCELLENT HARD COATED LAYER EXERTING DISPLACING EXCELLENT CHIPPING RESISTANCE UNDER HIGH SPEED AND DEEP CUTTING CONDITION

机译:在高速和深切削条件下,具有出色的硬涂层涂层的表面涂层金属陶瓷切削刀具具有出色的抗切削屑性能

摘要

PROBLEM TO BE SOLVED: To provide a surface coated cermet cutting tool having excellent hard coated layer exerting excellent chipping resistance under high speed and deep cutting conditions.;SOLUTION: The hard coated layer, 1 to 15μm thick on a total average layer thickness, of the surface coated cermet cutting tool comprising a hard coated layer made from a complex nitride layer made of Ti, Al and B physically vapour-deposited in the surface of a cermet base body has component concentration distribution structure wherein along the layer thickness direction, the Al and Ti contents continuously vary in the region where the Al highest content point and the Ti highest content point exist alternately and repeatedly at a specified interval and the two points are adjacent to each other. In addition, the Al highest point satisfies a composition formula [Al1-(X+m+n) TiX SimBn]N (where, X, m and n represent 0.20 to 0.45, 0.01 to 0.10, and 0.01 to 0.10 in an atomic ratio respectively), and the Ti highest content point satisfies a composition formula [Ti1-(Y+m+n)AlY SimBn] N (where, Y, m and n represent 0.05 to 0.20, 0.01 to 0.10, and 0.01 to 0.10 in an atomic ratio respectively), and the interval between the both points adjacent to each other must be 0.01 to 0.1μm.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:提供一种表面涂层的金属陶瓷切削工具,该工具具有优异的硬涂层,在高速和深切削条件下具有出色的抗崩刃性;解决方案:硬涂层的厚度为总平均层厚度的1至15μm在表面涂层金属陶瓷切削工具中,包括由物理气相沉积在金属陶瓷基体表面的,由Ti,Al和B制成的复合氮化物层制成的硬质涂层的硬质涂层,其中该组分浓度分布结构沿着层厚度方向, Al和Ti的含量在Al最高含量点和Ti最高含量点以规定的间隔交替且重复地存在且两点彼此相邻的区域中连续变化。另外,Al最高点满足组成式[Al 1-(X + m + n) Ti X Si m B n ] N(其中X,m和n分别表示原子比为0.20至0.45、0.01至0.10和0.01至0.10),并且Ti的最高含量点满足组成公式[Ti 1-(Y + m + n) Al Y Si m B n ] N(其中,Y,m和n分别表示原子比为0.05至0.20、0.01至0.10和0.01至0.10),并且彼此相邻的两点之间的间隔必须为0.01至0.1μm.COPYRIGHT:(C)2004,JPO

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号