首页> 外国专利> CONTAINER FOR TRANSPORTING SINGLE CRYSTAL FOR ETCHING, AND DEVICE FOR ETCHING SINGLE CRYSTAL

CONTAINER FOR TRANSPORTING SINGLE CRYSTAL FOR ETCHING, AND DEVICE FOR ETCHING SINGLE CRYSTAL

机译:用于传输单晶的容器以及用于单晶的器件

摘要

PROBLEM TO BE SOLVED: To provide a transport container and an etching device for a single crystal, easy in handleability and having structure effective for eliminating etching unevenness.;SOLUTION: This etching device is composed such that a receiving part 23 which is opened extendedly upward so as to enable placing of the single crystal 1 for etching thereon is provided in the transport container 2 for the single crystal, an opening 27 is formed on the bottom of the receiving part 23, a plurality of single crystal-receiving shafts 5 are provided protrusively on the bottom of an etching tank 4, and when putting the transport container 2 into the etching tank 4, the receiving shafts 5 are inserted through the opening 27 so that the single crystal 1 is upheld from the receiving part 23 by the receiving shafts 5.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:提供一种用于单晶的运输容器和蚀刻装置,其易于处理并且具有有效地消除蚀刻不均匀的结构。解决方案:该蚀刻装置构成为使得容纳部23向上开口地向上开口为了能够在其上放置用于蚀刻的单晶1设置在用于单晶的运输容器2中,在容纳部分23的底部上形成开口27,并设置了多个单晶接收轴5。在蚀刻槽4的底部突出地突出,并且在将运输容器2放入蚀刻槽4中时,将接收轴5穿过开口27插入,从而通过接收轴将单晶1从接收部23支撑。 5 .;版权:(C)2004,日本特许厅

著录项

  • 公开/公告号JP2004010468A

    专利类型

  • 公开/公告日2004-01-15

    原文格式PDF

  • 申请/专利权人 HITACHI CABLE LTD;

    申请/专利号JP20020170816

  • 发明设计人 NAGAYAMA TAKUJI;

    申请日2002-06-12

  • 分类号C30B33/10;H01L21/306;

  • 国家 JP

  • 入库时间 2022-08-21 23:34:37

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