METHOD FOR EXPOSING TO ELECTRON BEAM, SEMICONDUCTOR DEVICE, METHOD FOR PROCESSING EXPOSURE PATTERN DATA, AND PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a method for exposing to an electron beam which can improve a throughput while a pattern creating function is utilized and to provide a semiconductor device manufactured by using the same, a method for processing exposure pattern data and a program for processing the exposure pattern data.;SOLUTION: The method for exposing to the electron beam includes a step of exposing an integrated circuit pattern having a rectangular pad pattern disposed by cutting a wiring pattern on a substrate to the beam. The method includes a first step of dividing a plurality of rectangular patterns A', B' having an overlap at the position of the pad pattern (c) extending from divided wiring patterns (a), (b) and pad pattern (c) extending from these wiring patterns (a), (b) into a plurality of rectangular patterns having a size of the maximum shot size or less of the beam, and a second step of sequentially multiple exposing the plurality of the rectangular patterns divided in the first step to multiple expose at the position of the pad pattern (c).;COPYRIGHT: (C)2004,JPO