HYDROXY-AMINO THERMALLY CURED UNDERCOAT FOR 193NM LITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide a thermally cured polymer composition which is useful as an undercoat layer for a chemically amplified bilayer resist system, and to provide an optical lithographic substrate coated with the same.;SOLUTION: The thermally cured polymer composition is composed of a hydroxyl-containing polymer, an amino cross-linking agent, and a thermal acid generator, according to the general formula in Formula 1.;COPYRIGHT: (C)2004,JPO&NCIPI