LASER-ASSISTED CVD SYSTEM, LASER-ASSISTED CVD METHOD, PATTERN DEFECT CORRECTING SYSTEM, AND PATTERN DEFECT CORRECTING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a laser assisted CVD system capable of suppressing the occurrence of cracks in a film formed by laser assisted CVD by increasing adhesiveness between the film and the surface covered by the film.;SOLUTION: The laser-assisted CVD system has first means 2, 3 for turning a pretreatment gas into plasma by arc discharge and for supplying the plasma to a substrate 10, a means for laser beam irradiation, and a means for confining a film-forming gas by blocking off outside air. The system also has second means 4, 5, 6 for activating the film-forming gas, protected from outside air and then supplied to the substrate 10, by laser beam irradiation. The substrate 10 is moved and its film formation surface is pretreated by the first means 2, 3, and then is again moved for film formation on the pretreated surface by the second means 4, 5, 6.;COPYRIGHT: (C)2004,JPO