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Apparatus including defect correcting system which repeats a correcting of a reticle pattern defect and a correcting method using the apparatus
Apparatus including defect correcting system which repeats a correcting of a reticle pattern defect and a correcting method using the apparatus
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机译:包括重复校正掩模版图案缺陷的缺陷校正系统的设备和使用该设备的校正方法
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摘要
A reticle pattern defect correcting apparatus comprises a lithographic emulation system including an optical emulation system and a micromachining defect correcting system including a reticle defect correcting mechanism with a cantilever. Since correction of a reticle pattern defect is carried out while the transferred image is being observed in real time by the optical emulation system, it is possible to achieve an efficient reticle pattern correction while avoiding overcorrection and other problems.
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