首页> 外国专利> ADDITIVE FOR ACIDIC COPPER PLATING BATH, ACIDIC COPPER PLATING BATH CONTAINING THE ADDITIVE AND PLATING METHOD USING THE PLATING BATH

ADDITIVE FOR ACIDIC COPPER PLATING BATH, ACIDIC COPPER PLATING BATH CONTAINING THE ADDITIVE AND PLATING METHOD USING THE PLATING BATH

机译:酸性铜镀液添加剂,包含酸性铜镀液的添加剂和镀液方法

摘要

PROBLEM TO BE SOLVED: To provide an additive for an acidic copper plating bath with which copper plating can be applied to a substrate having fine holes such as through holes and via holes and to a resin film having a surface coated with metal such as copper, to provide an acidic copper plating bath containing the additive, and to provide a plating method using the plating bath.;SOLUTION: The additive for an acidic copper plating bath contains the following components of (a) to (c): (a) a polymer of an alkylamine and a glycol by 0.01 to 2 g/L; (b) polymer components by 0.01 to 10 g/L; and (c) carrier components by 0.02 to 200 mg/L. The acidic copper plating bath contains the same additive. The plating method uses the same plating bath.;COPYRIGHT: (C)2004,JPO
机译:要解决的问题:提供一种用于酸性镀铜浴的添加剂,利用该添加剂可将铜镀膜施加到具有细孔(例如通孔和通孔)的基板上以及表面镀有金属(例如铜)的树脂膜上,提供一种含有该添加剂的酸性铜电镀液,并提供一种使用该电镀液的电镀方法。;解决方案:一种酸性铜电镀液用添加剂包含以下(a)至(c)的成分:(a)a烷基胺和二醇的聚合物为0.01至2g / L; (b)聚合物成分为0.01至10 g / L; (c)载体成分为0.02至200 mg / L。酸性镀铜浴包含相同的添加剂。电镀方法使用相同的电镀液。;版权所有:(C)2004,日本特许厅

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