首页> 外国专利> LEVELLING AGENT FOR PLATING, ADDITIVE COMPOSITION FOR ACIDIC COPPER PLATING BATH, ACIDIC COPPER PLATING BATH, AND PLATING METHOD USING THE PLATING BATH

LEVELLING AGENT FOR PLATING, ADDITIVE COMPOSITION FOR ACIDIC COPPER PLATING BATH, ACIDIC COPPER PLATING BATH, AND PLATING METHOD USING THE PLATING BATH

机译:镀层助剂,酸性铜镀液的添加剂组成,酸性铜镀液以及使用该镀液的镀层方法

摘要

PROBLEM TO BE SOLVED: To provide a novel levelling agent for plating which gives excellent characteristics in any of plating appearance such as plating covering power for the insides or corner parts of blind via holes or through-holes and levelling property of a plated surface and is capable of coping with substrate defects.;SOLUTION: The levelling agent for plating comprises a copolymer of diallyl dialkyl ammonium alkyl sulfate, (metha) acryl amide and sulfur dioxide which contains a diallyl dialkyl ammonium alkyl sulfate unit, a (metha) acryl amide unit and a sulfur dioxide unit.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种新颖的镀层流平剂,该镀层流平剂在任何镀层外观中均具有优异的特性,例如盲孔或通孔的内部或角落部分的镀覆覆盖力以及镀层表面的流平性,并且解决方案:电镀用流平剂包括二烯丙基二烷基烷基硫酸烷基铵,(甲基)丙烯酰胺和二氧化硫的共聚物,其中二烯丙基二烷基烷基硫酸烷基铵单元,(甲基)丙烯酰胺单元和二氧化硫装置。;版权所有:(C)2008,日本特许厅&INPIT

著录项

  • 公开/公告号JP2008063624A

    专利类型

  • 公开/公告日2008-03-21

    原文格式PDF

  • 申请/专利权人 EBARA UDYLITE KK;

    申请/专利号JP20060243651

  • 发明设计人 ONO AKINOBU;SAWA MASAHIRO;

    申请日2006-09-08

  • 分类号C25D3/38;C25D7;

  • 国家 JP

  • 入库时间 2022-08-21 20:24:49

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