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Magnetron cathode and magnetron sputtering apparatus comprising the same
Magnetron cathode and magnetron sputtering apparatus comprising the same
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机译:磁控阴极和包括该磁控阴极的磁控溅射设备
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摘要
A magnetron cathode and a sputtering apparatus including the same are provided. The magnetron cathode includes three or more magnet units, each of which comprises a single magnet or a plurality of magnets having the same poles facing toward the same direction, wherein one magnet unit is disposed around the outer circumference of another magnet unit and adjacent magnet units have opposite poles facing toward the same direction. Uniform magnetic field distribution is obtained. Therefore, the erosion profile of a target is wide and uniform.
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