MAGNET STRUCTURE FOR MAGNETRON SPUTTERING APPARATUS AND CATHODE ELECTRODE UNIT, AND MAGNETRON SPUTTERING APPARATUS, AND METHOD FOR USING MAGNET STRUCTURE

摘要

PROBLEM TO BE SOLVED: To provide a magnet structure or the like which achieve widening of erosion of a target by changing the distribution of the line of magnetic force on a surface of the target by a simple driving mechanism.;SOLUTION: The magnet structure 110 for a magnetron sputtering apparatus is equipped with first and second fixed magnets 10, 13 arranged on a rear side of the target 20 so that magnetic poles of the same type are directed to the rear side of the target, and magnetic field correction means 11, 12 arranged on the rear side of the target 20 between the first and second fixed magnets 10, 13 and capable of changing the direction of the magnetic moment in a plane along the thickness direction and the width direction of the target 20.;COPYRIGHT: (C)2007,JPO&INPIT