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Method and apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same
Method and apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same
A method and an apparatus for generating a plasma, and a method and an apparatus for manufacturing a semiconductor device using the plasma. A gas flows along a flow path having the displacement identical to the lines of magnetic force of the main magnetic field, and high frequency alternating current is applied to the gas, thereby generating a gas plasma. The gas plasma is provided into a processing chamber to perform a process for manufacturing the semiconductor device.
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