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Apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same
Apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same
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机译:用于产生气体等离子体的设备,用于产生等离子体的气体组合物以及使用该设备制造半导体器件的方法
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摘要
A method for manufacturing a semiconductor device may include: forming a main magnetic field having an axis, and forming a subsidiary magnetic field substantially parallel to the axis; applying an alternating current along a path between the main and the subsidiary magnetic fields; allowing a gas to flow along a flow path along the path of the current so that a gas plasma is generated from the gas; providing the gas plasma into a chamber separated from a position where the gas plasma is generated; and performing a process for manufacturing a semiconductor device by employing the gas plasma.
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