A semiconductor cleaning device having a substantially cylindrical roller body made of polyvinyl acetal with a smooth outer surface and uniform material porosity having a mean flow pore pressure ranging from about 0.30 PSI to about 0.35 PSI with 95% of its pores ranging from 7 to 40 microns in size and a wet flow rate ranging from about 80.0 L/min to about 7.0 L/min.
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机译：一种半导体清洁装置，其具有由聚乙烯醇缩醛制成的基本为圆柱形的辊体，该辊体具有光滑的外表面和均匀的材料孔隙率，其平均流动孔隙压力为约0.30 PSI至约0.35 PSI，95％的孔隙为7至40微米尺寸和湿流量范围为约80.0 L / min至约7.0 L / min。
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