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Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions
Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions
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机译:增强具有围绕相位0和相位180区域的边界区域的明场相移掩模的方法
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摘要
A technique in which a first boundary region is added to the ends of phase zero (0) pattern defining polygons and a second boundary region is added to the ends of phase 180 pattern. This technique can improve line end pattern definition and improve the manufacturability and patterning process window. The added boundary region balances the light on both sides of the line ends, resulting in a more predictable final resist pattern.
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