首页> 外国专利> Semiconductor integrated circuit device having switching misfet and capacitor element and method of producing the same, including wiring therefor and method of producing such wiring

Semiconductor integrated circuit device having switching misfet and capacitor element and method of producing the same, including wiring therefor and method of producing such wiring

机译:具有开关杂散和电容器元件的半导体集成电路器件及其制造方法,包括其布线及其制造方法

摘要

A method of manufacturing a semiconductor integrated circuit device having a switching MISFET and a capacitor element formed over a semiconductor substrate, such as a DRAM, is disclosed. The dielectric film of the capacitor element is formed to be co-extensive with the capacitor electrode layer over it. The upper electrode of the capacitor element is formed to be larger than the lower electrode.
机译:公开了一种制造半导体集成电路器件的方法,该半导体集成电路器件具有开关MISFET和形成在诸如DRAM的半导体衬底上方的电容器元件。电容器元件的介电膜形成为与位于其上方的电容器电极层共延。电容器元件的上电极形成为大于下电极。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号