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A method for reducing effect of a narrow channel in a transistor in a semiconductor device with a trench isolation, and such a semiconductor device.
A method for reducing effect of a narrow channel in a transistor in a semiconductor device with a trench isolation, and such a semiconductor device.
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机译:一种用于减小具有沟槽隔离的半导体器件中的晶体管中的窄沟道的影响的方法,以及这种半导体器件。
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摘要
Narrow-channel effect free DRAM cell transistor structure for submicron isolation pitch DRAMs having lowed-doped substrate and active width-independent threshold voltage by employing conductive shield in the shallow trench isolation(STI). The resulting cell transistor structure is highly immune to parasitic E-field penetration from the gate and neighbouring storage node junctions via STI and will be very appropriate for Gbit scale DRAM technology. The conductive shield is biased with the negative voltage in order to minimize the sidewall depletion in the substrate.
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