the deposition of ti1 - xalxn using bipolar pulsed dual magnetron sputter deposition

摘要

Method for manufacturing a metal cutting tool comprising depositing a hard and wear resistant refractory coating comprising compounds of which at least one layer consists of a multilayered MX/LX/MX/LX laminar structure where the alternating layers MX and LX are carbides or nitrides with the elements M and L selected from the group consisting of Ti, Nb, Hf, V, Ta, Mo, Zr, Cr, Al, Si or W and mixtures thereof, of which at least one of MX or LX are electrically isolating, and that the other layer(s) comprise(s) wear resistant nitrides, carbides, oxides and/or carbonitrides as known in the art, onto a substrate. Reactive Bipolar Pulsed Dual Magnetron Sputtering (BPDMS) technique using magnetron pairs comprising either one M element target and one L element target or using magnetron pairs with two targets of the same element, arranged so that one target in the magnetron pair acts as anode and the other target acts as cathode and vice versa are used for the deposition.